EPITAXIAL ALIGNMENT OF POLYCRYSTALLINE SI FILMS ON (100) SI

被引：51

作者：

TSAUR, BY ^{[1
]}

HUNG, LS ^{[1
]}

机构：

[1] CALTECH,PASADENA,CA 91125

来源：

APPLIED PHYSICS LETTERS | 1980年 / 37卷 / 07期

关键词：

D O I：

10.1063/1.92031

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：648 / 651

页数：4

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