INFLUENCE OF SUBSTRATE AND TARGET TEMPERATURES ON PROPERTIES OF TRANSPARENT AND CONDUCTIVE DOPED ZNO THIN-FILMS PREPARED BY RF MAGNETRON SPUTTERING

被引:32
作者
MINAMI, T
SATO, H
SONODA, T
NANTO, H
TAKATA, S
机构
关键词
D O I
10.1016/0040-6090(89)90637-8
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:307 / 311
页数:5
相关论文
共 8 条
[1]  
Brodie D. E., 1980, Fourteenth IEEE Photovoltaic Specialists Conference 1980, P468
[2]   HIGHLY TRANSPARENT AND CONDUCTING INDIUM-DOPED ZINC-OXIDE FILMS BY SPRAY PYROLYSIS [J].
MAJOR, S ;
BANERJEE, A ;
CHOPRA, KL .
THIN SOLID FILMS, 1983, 108 (03) :333-340
[3]   HIGHLY CONDUCTIVE AND TRANSPARENT ZNO THIN-FILMS PREPARED BY RF MAGNETRON SPUTTERING IN AN APPLIED EXTERNAL DC MAGNETIC-FIELD [J].
MINAMI, T ;
NANTO, H ;
TAKATA, S .
THIN SOLID FILMS, 1985, 124 (01) :43-47
[4]   HIGHLY CONDUCTIVE AND TRANSPARENT ZINC-OXIDE FILMS PREPARED BY RF MAGNETRON SPUTTERING UNDER AN APPLIED EXTERNAL MAGNETIC-FIELD [J].
MINAMI, T ;
NANTO, H ;
TAKATA, S .
APPLIED PHYSICS LETTERS, 1982, 41 (10) :958-960
[5]   HIGHLY CONDUCTIVE AND TRANSPARENT ALUMINUM DOPED ZINC-OXIDE THIN-FILMS PREPARED BY RF MAGNETRON SPUTTERING [J].
MINAMI, T ;
NANTO, H ;
TAKATA, S .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1984, 23 (05) :L280-L282
[6]   HIGHLY CONDUCTIVE AND TRANSPARENT SILICON DOPED ZINC-OXIDE THIN-FILMS PREPARED BY RF MAGNETRON SPUTTERING [J].
MINAMI, T ;
SATO, H ;
NANTO, H ;
TAKATA, S .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1986, 25 (09) :L776-L779
[7]   GROUP-III IMPURITY DOPED ZINC-OXIDE THIN-FILMS PREPARED BY RF MAGNETRON SPUTTERING [J].
MINAMI, T ;
SATO, H ;
NANTO, H ;
TAKATA, S .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1985, 24 (10) :L781-L784
[8]   THE STABILITY OF ALUMINUM-DOPED ZNO TRANSPARENT ELECTRODES FABRICATED BY SPUTTERING [J].
TAKATA, S ;
MINAMI, T ;
NANTO, H .
THIN SOLID FILMS, 1986, 135 (02) :183-187