STRUCTURE AND PROPERTIES OF AL-1-PERCENT-SI THIN-FILMS ON SI AS A FUNCTION OF GAS IMPURITIES DURING DC MAGNETRON-SPUTTERED DEPOSITION

被引：6

作者：

FREAR, DR

CAMPBELL, AN

DRAPER, BL

MIKAWA, RE

机构：

来源：

JOURNAL OF ELECTRONIC MATERIALS | 1989年 / 18卷 / 04期

关键词：

D O I：

10.1007/BF02657782

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：517 / 525

页数：9

共 18 条

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