PROXIMITY EFFECT CORRECTION USING A DOSE COMPENSATION CURVE

被引：5

作者：

GREENEICH, JS

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 19卷 / 04期

关键词：

D O I：

10.1116/1.571258

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1269 / 1274

页数：6

共 19 条

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[5]

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[6]

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[9] HYBRID E-BEAM-DEEP-UV EXPOSURE USING PORTABLE CONFORMABLE MASKING (PCM) TECHNIQUE [J].

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[10] CORRECTIONS TO PROXIMITY EFFECTS IN ELECTRON-BEAM LITHOGRAPHY .1. THEORY [J].

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