COMPETING AMBIENT EFFECTS ON THE INTER-DIFFUSION IN PT/NI/AL FILMS

[1] [Anonymous], ION BEAM SURFACE LAY

[2] AMBIENT EFFECTS ON THE DIFFUSION OF CR AND SI IN THIN PT FILMS [J]. APPLIED PHYSICS LETTERS, 1980, 37 (02) : 161 - 162

[3] EFFECT OF CO ON THE LOW-TEMPERATURE DIFFUSION OF CR AND SI THROUGH THIN GOLD-FILMS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (06) : 1331 - 1334

[4] ANNEALING AMBIENT - A USEFUL PROBE FOR INTERFACE INTERACTIONS IN THIN-FILMS [J]. APPLIED PHYSICS LETTERS, 1981, 38 (11) : 860 - 862

[5] EFFECT OF OXYGEN ON THE DIFFUSION OF AL IN PT FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (07) : 4620 - 4622

[6] EFFECT OF OXYGEN ON THE DIFFUSION OF NI IN PT IN PT-NI-PT FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (01) : 512 - 514

[7] AMBIENT EFFECTS ON THE OUT-DIFFUSION OF GAAS THROUGH THIN GOLD-FILMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (06): : 1358 - 1359

[8] Pauling L., 1960, NATURE CHEM BOND

[9] SOMORJAI GA, 1972, PRINCIPLES SURFACE C, P249

[1] [Anonymous], ION BEAM SURFACE LAY

[2] AMBIENT EFFECTS ON THE DIFFUSION OF CR AND SI IN THIN PT FILMS [J]. APPLIED PHYSICS LETTERS, 1980, 37 (02) : 161 - 162

[3] EFFECT OF CO ON THE LOW-TEMPERATURE DIFFUSION OF CR AND SI THROUGH THIN GOLD-FILMS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (06) : 1331 - 1334

[4] ANNEALING AMBIENT - A USEFUL PROBE FOR INTERFACE INTERACTIONS IN THIN-FILMS [J]. APPLIED PHYSICS LETTERS, 1981, 38 (11) : 860 - 862

[5] EFFECT OF OXYGEN ON THE DIFFUSION OF AL IN PT FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (07) : 4620 - 4622

[6] EFFECT OF OXYGEN ON THE DIFFUSION OF NI IN PT IN PT-NI-PT FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (01) : 512 - 514

[7] AMBIENT EFFECTS ON THE OUT-DIFFUSION OF GAAS THROUGH THIN GOLD-FILMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (06): : 1358 - 1359

[8] Pauling L., 1960, NATURE CHEM BOND

[9] SOMORJAI GA, 1972, PRINCIPLES SURFACE C, P249