LOW-PRESSURE DISCHARGES - FUNDAMENTAL AND APPLICATIVE ASPECTS - A REVIEW

被引：49

作者：

CAROLI, S

机构：

来源：

JOURNAL OF ANALYTICAL ATOMIC SPECTROMETRY | 1987年 / 2卷 / 07期

关键词：

D O I：

10.1039/ja9870200661

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

引用

收藏

页码：661 / 680

页数：20

相关论文

共 274 条

[1] ENERGY-TRANSFER PROCESSES IN GLOW-DISCHARGES
ABRIL, I
GRASMARTI, A
VALLESABARCA, JA
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (03): : 1773 - 1778
[2] CHARACTERIZATION OF ALUMINUM COATINGS DEPOSITED IN A HOLLOW-CATHODE DISCHARGE
AHMED, NAG
TEER, DG
[J]. THIN SOLID FILMS, 1981, 80 (1-3) : 49 - 54
[3] RARE GAS-OXYGEN EFFECTS ON THE RF SPUTTER DEPOSITION OF PLATINUM
AITA, CR
TRAN, NC
[J]. JOURNAL OF APPLIED PHYSICS, 1983, 54 (10) : 6051 - 6052
[4] BASAL ORIENTATION ALUMINUM NITRIDE GROWN AT LOW-TEMPERATURE BY RF DIODE SPUTTERING
AITA, CR
[J]. JOURNAL OF APPLIED PHYSICS, 1982, 53 (03) : 1807 - 1808
[5] SPUTTER DEPOSITION OF PLATINUM FILMS IN ARGON OXYGEN AND NEON OXYGEN DISCHARGES
AITA, CR
TRAN, NC
[J]. JOURNAL OF APPLIED PHYSICS, 1984, 56 (04) : 958 - 963
[6] OPTICAL BEHAVIOR OF SPUTTER-DEPOSITED PLATINUM-OXIDE FILMS
AITA, CR
[J]. JOURNAL OF APPLIED PHYSICS, 1985, 58 (08) : 3169 - 3173
[7] THE EFFECT OF O-2 ON REACTIVELY SPUTTERED ZINC-OXIDE
AITA, CR
PURDES, AJ
LAD, RJ
FUNKENBUSCH, PD
[J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (10) : 5533 - 5536
[8] ENHANCEMENT OF TA+ FLUX BY SUBSTRATE BIASING DURING SPUTTER DEPOSITION OF TANTALUM NITROGEN FILMS
AITA, CR
MYERS, TA
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (02): : 348 - 351
[9] ARGON-OXYGEN INTERACTION IN RF-SPUTTERING GLOW-DISCHARGES
AITA, CR
MARHIC, ME
[J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (11) : 6584 - 6587
[10] THE EFFECT OF RF POWER ON REACTIVELY SPUTTERED ZINC-OXIDE
AITA, CR
LAD, RJ
TISONE, TC
[J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (12) : 6405 - 6410

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