共 30 条
[1]
Behrisch R., 1981, SPUTTERING PARTICLE, V1
[2]
ANALYSIS OF MONOMOLECULAR LAYERS OF SOLIDS BY SECONDARY ION EMISSION
[J].
ZEITSCHRIFT FUR PHYSIK,
1970, 230 (05)
:403-+
[3]
SPUTTER-INDUCED ROUGHNESS IN THERMAL SIO2 DURING AUGER SPUTTER PROFILING STUDIES OF THE SI-SIO2 INTERFACE
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY,
1980, 17 (01)
:44-46
[4]
ERLEWEIN J, 1980, THIN SOLID FILMS, V69, pL39
[5]
DEPTH RESOLUTION OF SPUTTER PROFILING INVESTIGATED BY COMBINED AUGER-X-RAY ANALYSIS OF THIN-FILMS
[J].
NUCLEAR INSTRUMENTS & METHODS,
1980, 168 (1-3)
:395-398
[6]
INTERFACE DEPTH RESOLUTION OF AUGER SPUTTER PROFILED NI/CR INTERFACES - DEPENDENCE ON ION-BOMBARDMENT PARAMETERS
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,
1985, 3 (03)
:1413-1417
[8]
HANDWERKER CA, IN PRESS DIFFUSION T
[9]
EVALUATION OF CONCENTRATION-DEPTH PROFILES BY SPUTTERING IN SIMS AND AES
[J].
APPLIED PHYSICS,
1976, 9 (01)
:59-66