COMPUTER-SIMULATION OF MATERIALS PROCESSING PLASMA DISCHARGES

被引:50
作者
KLINE, LE [1 ]
KUSHNER, MJ [1 ]
机构
[1] UNIV ILLINOIS,DEPT ELECT & COMP ENGN,URBANA,IL 61801
关键词
D O I
10.1080/10408438908244626
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
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页码:1 / 35
页数:35
相关论文
共 193 条
[81]  
Jensen R. J., 1983, Plasma Chemistry and Plasma Processing, V3, P163, DOI 10.1007/BF00566019
[82]   REACTIONS OF FLUORINE-ATOMS [J].
JONES, WE ;
SKOLNIK, EG .
CHEMICAL REVIEWS, 1976, 76 (05) :563-592
[83]  
JONES WE, 1976, CHEM REV, V5, P563
[85]  
Kee R., 1987, SAND878215
[86]  
KITAMORI K, 1987, 1987 P JPN S PLASM P, P227
[88]   ELECTRON AND CHEMICAL-KINETICS IN METHANE RF GLOW-DISCHARGE DEPOSITION PLASMAS [J].
KLINE, LE ;
PARTLOW, WD ;
BIES, WE .
JOURNAL OF APPLIED PHYSICS, 1989, 65 (01) :70-78
[89]   COMPUTER SIMULATION OF ELECTRICAL BREAKDOWN IN GASES - AVALANCHE AND STREAMER FORMATION [J].
KLINE, LE ;
SIAMBIS, JG .
PHYSICAL REVIEW A, 1972, 5 (02) :794-&
[90]   DIELECTRIC-PROPERTIES FOR SF6 AND SF6 MIXTURES PREDICTED FROM BASIC DATA [J].
KLINE, LE ;
DAVIES, DK ;
CHEN, CL ;
CHANTRY, PJ .
JOURNAL OF APPLIED PHYSICS, 1979, 50 (11) :6789-6796