SIMULTANEOUS FORMATION OF TIN AND TISI2 BY LAMP ANNEALING IN NH3 AMBIENT AND ITS APPLICATION TO DIFFUSION-BARRIERS

被引：28

作者：

OKAMOTO, T

SHIMIZU, M

OHSAKI, A

MASHIKO, Y

TSUKAMOTO, K

MATSUKAWA, T

NAGAO, S

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1987年 / 62卷 / 11期

关键词：

D O I：

10.1063/1.339035

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

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页码：4465 / 4470

页数：6

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