IMPURITY IONS IN A PLASMA PRODUCED BY ELECTRON-CYCLOTRON RESONANCE HEATING

被引：11

作者：

YONESU, A

KOMORI, A

KAWAI, Y

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1988年 / 27卷 / 08期

关键词：

D O I：

10.1143/JJAP.27.1482

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1482 / 1487

页数：6

共 10 条

[1] PRODUCTION OF A LARGE DIAMETER HOT-ELECTRON PLASMA BY ELECTRON-CYCLOTRON RESONANCE HEATING [J].

KAWAI, Y ;

SAKAMOTO, K .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1982, 53 (05) :606-609

[2] PLASMA POTENTIAL MEASUREMENTS BY ELECTRON EMISSIVE PROBES [J].

KEMP, RF ;

SELLEN, JM .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1966, 37 (04) :455-&

[3] SPUTTERING YIELDS OF METALS FOR AR+ AND NE+ IONS WITH ENERGIES FROM 50 TO 600 EV [J].

LAEGREID, N ;

WEHNER, GK .

JOURNAL OF APPLIED PHYSICS, 1961, 32 (03) :365-&

[4] PRODUCTION OF QUIESCENT DISCHARGE WITH HIGH ELECTRON TEMPERATURES [J].

LISITANO, G ;

ELLIS, RA ;

HOOKE, WM ;

STIX, TH .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1968, 39 (03) :295-&

[5] DEPOSITION OF ATOMS SPUTTERED IN AN ABNORMAL GLOW DISCHARGE [J].

MASE, H ;

NAKAYA, S ;

HATTA, Y .

JOURNAL OF APPLIED PHYSICS, 1967, 38 (07) :2960-&

[6] SPUTTERING OF POLYCRYSTALLINE COPPER + SILVER BY 30-170 KEV ARGON IONS [J].

RAMER, CE ;

REYNOLDS, HK ;

NARASIMHAM, MA ;

ALLRED, JC .

JOURNAL OF APPLIED PHYSICS, 1964, 35 (06) :1673-+

[7] ENERGY DISTRIBUTION OF SPUTTERED CU ATOMS [J].

STUART, RV ;

WEHNER, GK .

JOURNAL OF APPLIED PHYSICS, 1964, 35 (06) :1819-&

[8]

TAWARA H, 1985, IPPJAM37 NAG U I PLA

[9] MASS SPECTROMETRIC STUDY OF NEUTRAL PARTICLES SPUTTERED FROM CU BY 0- TO 100-EV AR IONS [J].

WOODYARD, JR ;

COOPER, CB .

JOURNAL OF APPLIED PHYSICS, 1964, 35 (04) :1107-&

[10] SPUTTERING OF SINGLE-CRYSTAL COPPER AND ALUMINUM WITH 20-600 EV ARGON IONS [J].

ZDANUK, EJ ;

WOLSKY, SP .

JOURNAL OF APPLIED PHYSICS, 1965, 36 (05) :1683-&

← 1 →