PARALLEL OXIDATION MODEL FOR SI INCLUDING BOTH MOLECULAR AND ATOMIC OXYGEN MECHANISMS

被引：7

作者：

DELARIOS, JM ^{[1
]}

HELMS, CR ^{[1
]}

KAO, DB ^{[1
]}

DEAL, BE ^{[1
]}

机构：

[1] ADVANTAGE PROD TECHNOL INC,SUNNYVALE,CA 94086

来源：

APPLIED SURFACE SCIENCE | 1989年 / 39卷 / 1-4期

关键词：

D O I：

10.1016/0169-4332(89)90422-4

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：89 / 102

页数：14

共 29 条

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[8] EXPERIMENTAL-OBSERVATIONS OF CHEMISTRY OF SIO2-SI INTERFACE [J].

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[9]

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[10]

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