REACTIVE ION ETCHING OF INP WITH BR2-CONTAINING GASES TO PRODUCE SMOOTH, VERTICAL WALLS - FABRICATION OF ETCHED-FACETED LASERS

被引：26

作者：

TAKIMOTO, K

OHNAKA, K

SHIBATA, J

机构：

来源：

APPLIED PHYSICS LETTERS | 1989年 / 54卷 / 20期

关键词：

D O I：

10.1063/1.101202

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：1947 / 1949

页数：3

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