ION MIXING OF AL2O3 AND AL FILMS ON SIO2

被引：7

作者：

GALUSKA, AA ^{[1
]}

UHT, JC ^{[1
]}

ADAMS, PM ^{[1
]}

COGGI, JM ^{[1
]}

机构：

[1] AEROSPACE CORP,MAT SCI LAB,EL SEGUNDO,CA 90245

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 02期

关键词：

D O I：

10.1116/1.574978

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：185 / 192

页数：8

共 16 条

[1] ION-BEAM BONDING OF THIN-FILMS
BAGLIN, JEE
CLARK, GJ
[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1985, 7-8 (MAR) : 881 - 885
[2] SOLID-PHASE REDUCTION OF SIO2 IN THE PRESENCE OF AN AL LAYER
BLATTNER, RJ
BRAUNDMEIER, AJ
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (03): : 320 - 323
[3] CHARACTERIZATION OF AMORPHOUS SIOX LAYERS WITH ESCA
FINSTER, J
SCHULZE, D
MEISEL, A
[J]. SURFACE SCIENCE, 1985, 162 (1-3) : 671 - 679
[4] REACTIVE AND NONREACTIVE ION MIXING OF NI FILMS ON CARBON SUBSTRATES
GALUSKA, AA
UHT, JC
ADAMS, PM
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (01): : 99 - 109
[5] IMPLANT AND IMPURITY REDISTRIBUTION DURING ION INDUCED TASI2 FORMATION
GALUSKA, AA
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (01): : 1 - 9
[6] EVALUATION OF MICROHARDNESS AND SCRATCH TESTING FOR OPTICAL COATINGS
GOLDSTEIN, IS
DELONG, R
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (03): : 327 - 330
[7] KINETICS OF TISI2 FORMATION BY THIN TI FILMS ON SI
HUNG, LS
GYULAI, J
MAYER, JW
LAU, SS
NICOLET, MA
[J]. JOURNAL OF APPLIED PHYSICS, 1983, 54 (09) : 5076 - 5080
[8] THE USE OF FAST HEAVY-IONS TO IMPROVE THIN-FILM ADHESION
JACOBSON, S
JONSSON, B
SUNDQVIST, B
[J]. THIN SOLID FILMS, 1983, 107 (01) : 89 - 98
[9] ION-INDUCED SILICIDE FORMATION IN NIOBIUM THIN-FILMS
MATTESON, S
ROTH, J
NICOLET, MA
[J]. RADIATION EFFECTS AND DEFECTS IN SOLIDS, 1979, 42 (3-4): : 217 - 226
[10] Mattox D. M., 1978, Adhesion Measurement of Thin Films, Thick Films and Bulk Coatings, P54, DOI 10.1520/STP38624S

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