DEPOSITION AND CHARACTERIZATION OF A-SI-H FILMS PREPARED BY REACTIVE ION-BEAM SPUTTERING

被引：5

作者：

BHAN, MK ^{[1
]}

KASHYAP, SC ^{[1
]}

MALHOTRA, LK ^{[1
]}

机构：

[1] INDIAN INST TECHNOL,CTR MAT SCI & TECHNOL,NEW DELHI 110016,INDIA

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1988年 / 101卷 / 01期

关键词：

D O I：

10.1016/0022-3093(88)90375-4

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：111 / 116

页数：6

共 19 条

[1]

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