MICROSTRUCTURE AND PROPERTIES OF DUAL ION-BEAM SPUTTERED TUNGSTEN FILM

被引：22

作者：

KAO, AS

HWANG, C

NOVOTNY, VJ

DELINE, VR

GORMAN, GL

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 05期

关键词：

D O I：

10.1116/1.576301

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：2966 / 2974

页数：9

共 18 条

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[10] MICROSTRUCTURE, GROWTH, RESISTIVITY, AND STRESSES IN THIN TUNGSTEN FILMS DEPOSITED BY RF SPUTTERING
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