THERMALLY STIMULATED CAPACITANCE FOR SHALLOW MAJORITY-CARRIER TRAPS IN EDGE REGION OF SEMICONDUCTOR JUNCTIONS

被引:39
作者
SAH, CT
WALKER, JW
机构
[1] UNIV ILLINOIS, DEPT ELECTR ENGN, URBANA, IL 61801 USA
[2] UNIV ILLINOIS, MAT RES LAB, URBANA, IL 61801 USA
关键词
D O I
10.1063/1.1654683
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:384 / 385
页数:2
相关论文
共 19 条
[1]   DEFECT CENTERS IN BORON-IMPLANTED SILICON [J].
CHAN, WW ;
SAH, CT .
JOURNAL OF APPLIED PHYSICS, 1971, 42 (12) :4768-&
[2]   RESIDUAL ELECTRICALLY ACTIVE DEFECTS AFTER LATTICE REORDERING IN ION-IMPLANTED SILICON [J].
DAVIES, DE ;
ROOSILD, S .
APPLIED PHYSICS LETTERS, 1971, 18 (12) :548-&
[3]  
FU HS, 1972, B AM PHYS SOC, V17, P307
[4]   THERMAL IONIZATION RATES AND ENERGIES OF HOLES AT DOUBLE ACCEPTOR ZINC CENTERS IN SILICON [J].
HERMAN, JM ;
SAH, CT .
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1972, 14 (02) :405-415
[5]   PHOTOCAPACITANCE STUDIES OF DEEP-DOUBLE ELECTRON-TRAP OXYGEN IN GALLIUM-PHOSPHIDE [J].
KUKIMOTO, H ;
HENRY, CH ;
MILLER, GL .
APPLIED PHYSICS LETTERS, 1972, 21 (06) :251-&
[6]  
KUKIMOTO H, TO BE PUBLISHED
[7]   THERMAL EMISSION AND CAPTURE OF ELECTRONS AT SULFUR CENTERS IN SILICON [J].
ROSIER, LL ;
SAH, CT .
SOLID-STATE ELECTRONICS, 1971, 14 (01) :41-+
[8]   PHOTOIONIZATION OF ELECTRONS AT SULFUR CENTERS IN SILICON [J].
ROSIER, LL ;
SAH, CT .
JOURNAL OF APPLIED PHYSICS, 1971, 42 (10) :4000-&
[9]   THERMAL EMISSION RATES OF CARRIERS AT GOLD CENTERS IN SILICON [J].
SAH, CT ;
FORBES, L ;
ROSIER, LI ;
TASCH, AF ;
TOLE, AB .
APPLIED PHYSICS LETTERS, 1969, 15 (05) :145-+
[10]   DIRECT OBSERVATION OF MULTIPLICITY OF IMPURITY CHARGE STATES IN SEMICONDUCTORS FROM LOW-TEMPERATURE HIGH-FREQUENCY PHOTOCAPACITANCE [J].
SAH, CT ;
ROSIER, LL ;
FORBES, L .
APPLIED PHYSICS LETTERS, 1969, 15 (10) :316-&