THERMALLY STIMULATED CAPACITANCE FOR SHALLOW MAJORITY-CARRIER TRAPS IN EDGE REGION OF SEMICONDUCTOR JUNCTIONS

被引:39
作者
SAH, CT
WALKER, JW
机构
[1] UNIV ILLINOIS, DEPT ELECTR ENGN, URBANA, IL 61801 USA
[2] UNIV ILLINOIS, MAT RES LAB, URBANA, IL 61801 USA
关键词
D O I
10.1063/1.1654683
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:384 / 385
页数:2
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