A STUDY OF THE ALTERED LAYER PRODUCED BY OXYGEN BOMBARDMENT OF SILICON

被引：13

作者：

CLARK, EA

DOWSETT, MG

SPILLER, GDT

THOMAS, GR

AUGUSTUS, PD

SUTHERLAND, I

机构：

[1] BRITISH TELECOM RES LABS,IPSWICH IP5 7RE,SUFFOLK,ENGLAND

[2] PLESSEY RES CTR CASWELL LTD,ALLEN CLARK RES CTR,CASWELL NN12 8EQ,NORTHANTS,ENGLAND

[3] LOUGHBOROUGH UNIV TECHNOL,LOUGHBOROUGH LE11 3TU,LEICS,ENGLAND

来源：

VACUUM | 1988年 / 38卷 / 8-10期

关键词：

D O I：

10.1016/0042-207X(88)90496-4

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：937 / 941

页数：5

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