RAMAN-SCATTERING CHARACTERIZATION OF TITANIUM SILICIDE FORMATION

被引：35

作者：

NEMANICH, RJ ^{[1
]}

FIORDALICE, RW ^{[1
]}

JEON, HT ^{[1
]}

机构：

[1] N CAROLINA STATE UNIV,DEPT MAT SCI & ENGN,RALEIGH,NC 27695

来源：

IEEE JOURNAL OF QUANTUM ELECTRONICS | 1989年 / 25卷 / 05期

关键词：

D O I：

10.1109/3.27991

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：997 / 1002

页数：6

共 25 条

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