EFFECT OF A FINITE RF CONDUCTANCE OF NATIVE OXIDE ON INP METAL-INSULATOR SEMICONDUCTOR ADMITTANCE

被引:4
作者
BOUCHIKHI, B
VALMONT, G
MICHEL, C
RAVELET, S
机构
[1] Ecole Superieure des Sciences et, Technologies de l'Ingenieur de, Nancy, Vandoeuvre, Fr, Ecole Superieure des Sciences et Technologies de l'Ingenieur de Nancy, Vandoeuvre, Fr
关键词
D O I
10.1016/0040-6090(87)90094-0
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
CAPACITORS
引用
收藏
页码:227 / 235
页数:9
相关论文
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