PREPARATION AND CHARACTERIZATION OF REACTIVELY SPUTTERED SILICON-NITRIDE THIN-FILMS

被引：27

作者：

GHOSH, SK

HATWAR, TK

机构：

来源：

THIN SOLID FILMS | 1988年 / 166卷 / 1-2期

关键词：

D O I：

10.1016/0040-6090(88)90398-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：359 / 366

页数：8

共 14 条

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[9] CHARACTERIZATION OF LOW-PRESSURE CHEMICALLY VAPOUR-DEPOSITED THIN SILICON-NITRIDE FILMS [J].

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