ETCHING OF GAAS FOR PATTERNING BY IRRADIATION WITH AN ELECTRON-BEAM AND CL-2 MOLECULES

被引：30

作者：

AKITA, K

TANEYA, M

SUGIMOTO, Y

HIDAKA, H

KATAYAMA, Y

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1989年 / 7卷 / 06期

关键词：

D O I：

10.1116/1.584514

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

收藏

页码：1471 / 1474

页数：4

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