PROPERTIES OF HYDROGENATED AMORPHOUS-SILICON CARBIDE FILMS PREPARED BY PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION

被引：43

作者：

KUHMAN, D

GRAMMATICA, S

JANSEN, F

机构：

来源：

THIN SOLID FILMS | 1989年 / 177卷

关键词：

D O I：

10.1016/0040-6090(89)90573-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：253 / 262

页数：10

共 15 条

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