ENHANCED ARE APPARATUS AND TIN SYNTHESIS

被引：35

作者：

YOSHIHARA, H

MORI, H

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1979年 / 16卷 / 04期

关键词：

D O I：

10.1116/1.570130

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

To apply the activated reactive evaporation (ARE) process to coatings for telecommunication components, the deposition rate must be less than 0. 1 mu m/min. The weak points in the ARE process have been improved by attachment of an electron emitting electrode. The new process was tested by synthesizing titanium nitride. Film properties were examined by measuring Vickers hardness and residual stress, observation of surface and cross-section morphology, and x-ray diffraction analysis.

引用

页码：1007 / 1012

页数：6

共 8 条

[1] ALUMINA DEPOSITION BY ACTIVATED REACTIVE EVAPORATION
BUNSHAH, RF
SCHRAMM, RJ
[J]. THIN SOLID FILMS, 1977, 40 (JAN) : 211 - 216
[2] ACTIVATED REACTIVE EVAPORATION PROCESS FOR HIGH RATE DEPOSITION OF COMPOUNDS
BUNSHAH, RF
RAGHURAM, AC
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (06): : 1385 - &
[3] SYNTHESIS OF VARIOUS OXIDES IN TI-O SYSTEM BY REACTIVE EVAPORATION AND ACTIVATED REACTIVE EVAPORATION TECHNIQUES
GROSSKLAUS, W
BUNSHAH, RF
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (01): : 593 - 597
[4] PREPARATION OF HARD COATINGS
HILL, RJ
SCHEUERMANN, G
LUCARIELLO, R
[J]. THIN SOLID FILMS, 1977, 40 (JAN) : 217 - 222
[5] RESIDUAL-STRESS IN SILICON-NITRIDE FILMS
IRENE, EA
[J]. JOURNAL OF ELECTRONIC MATERIALS, 1976, 5 (03) : 287 - 298
[6] APPLICATIONS OF WEAR-RESISTANT THICK-FILMS FORMED BY PHYSICAL VAPOR-DEPOSITION PROCESSES
NAKAMURA, K
INAGAWA, K
TSURUOKA, K
KOMIYA, S
[J]. THIN SOLID FILMS, 1977, 40 (JAN) : 155 - 167
[7] SYNTHESIS OF ALLOY CARBIDES BY ACTIVATED REACTIVE EVAPORATION PROCESS
NIMMAGADDA, R
BUNSHAH, RF
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (01): : 585 - 587
[8] STRUCTURE OF TIC-NI COATINGS SYNTHESIZED BY ACTIVATED REACTIVE EVAPORATION
SARIN, VK
BUNSHAH, RF
NIMMAGADDA, R
[J]. THIN SOLID FILMS, 1977, 40 (JAN) : 183 - 188

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