CONDUCTION IN N+-I-N+ THIN-FILM POLYCRYSTALLINE SILICON DEVICES IN RELATION TO THE FILM DEPOSITION CONDITIONS

被引：8

作者：

DIMITRIADIS, CA ^{[1
]}

PAPADIMITRIOU, L ^{[1
]}

STOEMENOS, J ^{[1
]}

ECONOMOU, NA ^{[1
]}

MEAKIN, DB ^{[1
]}

COXON, PA ^{[1
]}

机构：

[1] GEC RES LTD,HIRST RES CTR,WEMBLEY HA9 7PP,MIDDX,ENGLAND

来源：

JOURNAL OF APPLIED PHYSICS | 1988年 / 63卷 / 04期

关键词：

D O I：

10.1063/1.340015

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：1104 / 1110

页数：7

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