AFTERGLOW AND DECAYING PLASMA CVD SYSTEMS

被引：20

作者：

BARDOS, L

机构：

来源：

VACUUM | 1988年 / 38卷 / 8-10期

关键词：

D O I：

10.1016/0042-207X(88)90433-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

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页码：637 / 642

页数：6

相关论文

共 46 条

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[7] NEGATIVE ROLE OF FAST ELECTRONS IN MICROWAVE OXIDATION OF SILICON
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[8] METHOD OF FORMATION OF THIN OXIDE-FILMS ON SILICON IN A MICROWAVE MAGNETOACTIVE OXYGEN PLASMA
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[10] BARDOS L, UNPUB J PHYS D

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