STRUCTURE OF TINX (0-LESS-THAN-X-LESS-THAN-1.1) FILMS PREPARED BY IRON BEAM-ASSISTED DEPOSITION

被引:19
作者
JIANG, H
TAO, K
LI, H
机构
[1] Department of Materials Science and Engineering, Tsinghua University, Beijing
关键词
ION BOMBARDMENT; RUTHERFORD BACKSCATTERING SPECTROMETRY; TITANIUM NITRIDE;
D O I
10.1016/0040-6090(94)06367-2
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
TiNx films with various x values were prepared by ion beam-assisted deposition. The composition and structure of the films were investigated by Rutherford backscattering spectroscopy and X-ray diffraction (XRD). The results of XRD indicated that the films consisted of free alpha-Ti when x was less than 0.5. delta-TiNx films were formed when x was larger than 0.5. At critical value of x = 0.5, an amorphous film was obtained. For the delta-TiNx films, it was observed that the films had preferred orientation. The preferred orientation of the films changed from [111] to [100] with ion current density.
引用
收藏
页码:51 / 55
页数:5
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