LOW-PRESSURE RF ANNEALING - NEW TECHNIQUE TO REMOVE CHARGE CENTERS IN MIS DIELECTRICS

被引：9

作者：

MA, TP

MA, WHL

机构：

来源：

APPLIED PHYSICS LETTERS | 1978年 / 32卷 / 07期

关键词：

D O I：

10.1063/1.90079

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：441 / 444

页数：4

共 11 条

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[7]

MA TS, UNPUBLISHED

[8]

MA WHL, 1977, TECHNICAL DIGEST, P151

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PROCEEDINGS OF THE IEEE, 1974, 62 (09) :1236-1241

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SCOGGAN, GA ;

MA, TP .

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