ORIGIN AND PROPERTIES OF INTERFACE STATES AT INSULATOR SEMICONDUCTOR AND SEMICONDUCTOR SEMICONDUCTOR INTERFACES OF COMPOUND SEMICONDUCTORS

被引:16
作者
HASEGAWA, H
OHNO, H
ISHII, H
HAGA, T
ABE, Y
TAKAHASHI, H
机构
[1] HOKKAIDO UNIV, FAC ENGN, DEPT NUCL ENGN, SAPPORO, HOKKAIDO 060, JAPAN
[2] HOKKAIDO UNIV, FAC ENGN, DEPT MET ENGN, SAPPORO, HOKKAIDO 060, JAPAN
关键词
D O I
10.1016/0169-4332(89)90087-1
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Electrical characterization reveals several salient common electronic features of insulator-semiconductor (I-S) and semiconductor-semiconductor (S-S) interfaces. Currently available models on the origin of states (defect model, DIGS model, effective workfunction model) are compared in their capabilities of explaining these features. The DIGS (disorder-induced gap state) model is shown to possess maximum capability and consistency. Study of the microstructure of interface by cross-sectional TEM and RBS techniques revealed a strong correlation between lattice disorder and interface state density, and supports the DIGS model. © 1989.
引用
收藏
页码:372 / 382
页数:11
相关论文
共 38 条
[21]   THEORY OF THE ELECTRONIC-STRUCTURE OF THE SI-SIO2 INTERFACE [J].
LAUGHLIN, RB ;
JOANNOPOULOS, JD ;
CHADI, DJ .
PHYSICAL REVIEW B, 1980, 21 (12) :5733-5744
[22]   ELECTRONIC-STRUCTURE OF A METAL-SEMICONDUCTOR INTERFACE [J].
LOUIE, SG ;
COHEN, ML .
PHYSICAL REVIEW B, 1976, 13 (06) :2461-2469
[23]   SI-SIO2 INTERFACE - ELECTRICAL PROPERTIES AS DETERMINED BY METAL-INSULATOR-SILICON CONDUCTANCE TECHNIQUE [J].
NICOLLIA.EH ;
GOETZBER.A .
BELL SYSTEM TECHNICAL JOURNAL, 1967, 46 (06) :1055-+
[24]   UNPINNED (100) GAAS-SURFACES IN AIR USING PHOTOCHEMISTRY [J].
OFFSEY, SD ;
WOODALL, JM ;
WARREN, AC ;
KIRCHNER, PD ;
CHAPPELL, TI ;
PETTIT, GD .
APPLIED PHYSICS LETTERS, 1986, 48 (07) :475-477
[25]   A COMPUTER-SIMULATION OF THE RECOMBINATION PROCESS AT COMPOUND SEMICONDUCTOR SURFACES AND HETERO-INTERFACES [J].
SAITOH, T ;
HASEGAWA, H ;
KONISHI, S ;
OHNO, H .
APPLIED SURFACE SCIENCE, 1989, 41-2 :402-406
[26]   THEORY OF CONTINUOUSLY DISTRIBUTED TRAP STATES AT SI-SIO2 INTERFACES [J].
SAKURAI, T ;
SUGANO, T .
JOURNAL OF APPLIED PHYSICS, 1981, 52 (04) :2889-2896
[27]   SMALL-SIGNAL ADMITTANCE STUDY OF GAAS ANODIC MOS SYSTEM [J].
SAWADA, T ;
HASEGAWA, H .
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1979, 54 (02) :689-696
[28]  
SAWADA T, 1980, IEEE T ELECTRON DEV, V27, P1038
[29]   THE ORIGIN AND NATURE OF SILICON BAND-GAP STATES AT THE SI-SIO2 INTERFACE [J].
SINGH, J ;
MADHUKAR, A .
APPLIED PHYSICS LETTERS, 1981, 38 (11) :884-886
[30]   NEW AND UNIFIED MODEL FOR SCHOTTKY-BARRIER AND III-V INSULATOR INTERFACE STATES FORMATION [J].
SPICER, WE ;
CHYE, PW ;
SKEATH, PR ;
SU, CY ;
LINDAU, I .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (05) :1422-1433