RECENT PROGRESS IN REFRACTORY-METAL SILICIDE FORMATION BY ION-BEAM MIXING AND ITS APPLICATIONS TO VLSI

被引：14

作者：

OKABAYASHI, H

机构：

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1989年 / 39卷 / 1-4期

关键词：

D O I：

10.1016/0168-583X(89)90781-7

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：246 / 252

页数：7

共 47 条

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