APPLICATION OF MOSI2 TO THE DOUBLE-LEVEL INTERCONNECTIONS OF I2L CIRCUITS

被引：2

作者：

SASAKI, Y

OZAWA, O

KAMEYAMA, S

机构：

来源：

IEEE JOURNAL OF SOLID-STATE CIRCUITS | 1980年 / 15卷 / 04期

关键词：

D O I：

10.1109/JSSC.1980.1051420

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：450 / 454

页数：5

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