Superlattices of InGaAs/InP have been grown by OMVPE using short interval H-2-only growth interrupts to eliminate intermixing of hydride gases at the heterojunction interfaces. Changes in lattice strain resulting from interlayer alloying were measured by X-ray diffraction. The changes in strain are small and consistent with decomposition of the surfaces when exposed to the nonequilibrium H-2 vapor. Possible interface smoothing is seen with H-2 interrupt at the InGaAs to InP transition. A large compressive strain contribution is unaffected by the interrupts and is attributed to As carryover into the InP from surrounding solid deposits rather than the transport gases.