HILLOCK GROWTH ON LEAD FILMS UPON CYCLING TO CRYOGENIC TEMPERATURES

被引：5

作者：

FU, CY ^{[1
]}

VANDUZER, T ^{[1
]}

机构：

[1] UNIV CALIF BERKELEY,ELECTR RES LAB,BERKELEY,CA 94720

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1980年 / 17卷 / 03期

关键词：

D O I：

10.1116/1.570554

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：752 / 754

页数：3

共 12 条

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[5]

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[7] REVERSIBLE HILLOCK GROWTH IN THIN FILMS [J].

LAHIRI, SK ;

WELLS, OC .

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[8] ABSENCE OF HILLOCK FORMATION IN EPITAXIAL LEAD FILMS [J].

LAHIRI, SK .

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[9] THERMAL STRAIN IN LEAD THIN-FILMS .2. STRAIN RELAXATION MECHANISMS [J].

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[10] HILLOCK GROWTH AND STRESS RELIEF IN SPUTTERED AU FILMS [J].

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