AUTOMATIC MARK DETECTION IN ELECTRON-BEAM NANOLITHOGRAPHY USING DIGITAL IMAGE-PROCESSING AND CORRELATION

被引:26
作者
BOEGLI, V
KERN, DP
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1990年 / 8卷 / 06期
关键词
D O I
10.1116/1.584890
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A method of mark detection for a vector scan e-beam nanolithography system has been developed, in particular, taking into account that fairly low beam currents are used in high resolution writing. The digitally stored image of the scanned mark region is compared to a computer generated template using an advanced correlation technique. This method does not require a threshold determination. It exhibits high immunity to noise and poor contrast in the mark signal. The achieved accuracy is better than one beam step size (LSB) even for partially damaged marks. Due to specially chosen mark shapes, the probability of detecting wrong features is low. This paper describes the method and its hardware implementation along with experimental results for accuracy and repeatability of the mark position evaluation.
引用
收藏
页码:1994 / 2001
页数:8
相关论文
共 10 条
  • [1] Barker R. H., 1953, GROUP SYNCHRONIZING, P273
  • [2] DAVIS DE, 1977, IBM J RES DEV, V21, P498, DOI 10.1147/rd.216.0498
  • [3] DAVIS DE, 1981, P MICROCIRCUIT ENG, P147
  • [4] A PATTERN-RECOGNITION TECHNIQUE USING SEQUENCES OF MARKS FOR REGISTRATION IN ELECTRON-BEAM LITHOGRAPHY
    HOLBURN, DM
    JONES, GAC
    AHMED, H
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 1229 - 1233
  • [5] PIEZO LOCKING STAGE FOR NANOMETER ELECTRON-BEAM LITHOGRAPHY
    KRATSCHMER, E
    RISHTON, SA
    LUHN, HE
    KERN, DP
    CHANG, THP
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1989, 7 (06): : 1418 - 1421
  • [6] KRATSCHMER E, 1984, P MICROCIRCUIT ENG 8, P203
  • [7] SHOT NOISE ERRORS IN REGISTRATION FOR ELECTRON LITHOGRAPHY
    OWEN, G
    [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1986, 19 (11) : 2209 - 2223
  • [8] COMPUTER-CONTROLLED ELECTRON-BEAM MICROFABRICATION MACHINE WITH A NEW REGISTRATION SYSTEM
    SAITOU, N
    MUNAKATA, C
    MIURA, Y
    HONDA, Y
    [J]. JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS, 1974, 7 (06): : 441 - 444
  • [9] HIGH-PRECISION AUTOMATIC ALIGNMENT PROCEDURE FOR VECTOR SCAN E-BEAM LITHOGRAPHY
    STEPHANI, D
    FROSCHLE, E
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (03): : 906 - 908
  • [10] EXPERIMENTAL SCANNING ELECTRON-BEAM AUTOMATIC REGISTRATION SYSTEM
    WILSON, AD
    CHANG, THP
    KERN, A
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1240 - 1245