N-CHANNEL ENHANCEMENT-MODE MOSFET CHARACTERISTICS FROM 10-K TO 300-K

被引:43
作者
TEWKSBURY, SK
机构
关键词
D O I
10.1109/T-ED.1981.20640
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:1519 / 1529
页数:11
相关论文
共 26 条
[1]   THEORY OF CARRIER-DENSITY FLUCTUATIONS IN AN IGFET NEAR THRESHOLD [J].
BREWS, JR .
JOURNAL OF APPLIED PHYSICS, 1975, 46 (05) :2181-2192
[2]  
BREWS JR, 1975, J APP PHYS, V46, P2993
[3]   1 MU-M MOSFET VLSI TECHNOLOGY .2. DEVICE DESIGNS AND CHARACTERISTICS FOR HIGH-PERFORMANCE LOGIC APPLICATIONS [J].
DENNARD, RH ;
GAENSSLEN, FH ;
WALKER, EJ ;
COOK, PW .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1979, 26 (04) :325-333
[4]   HOT ELECTRON EFFECTS AND SATURATION VELOCITIES IN SILICON INVERSION LAYERS [J].
FANG, FF ;
FOWLER, AB .
JOURNAL OF APPLIED PHYSICS, 1970, 41 (04) :1825-+
[5]   TRANSPORT PROPERTIES OF ELECTRONS IN INVERTED SILICON SURFACES [J].
FANG, FF ;
FOWLER, AB .
PHYSICAL REVIEW, 1968, 169 (03) :619-+
[6]   VERY SMALL MOSFETS FOR LOW-TEMPERATURE OPERATION [J].
GAENSSLEN, FH ;
RIDEOUT, VL ;
WALKER, EJ ;
WALKER, JJ .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1977, 24 (03) :218-229
[7]   INVERSION LAYER CARRIER MOBILITY IN METAL-OXIDE-SEMICONDUCTOR DEVICES [J].
HSING, CT ;
KENNEDY, D ;
VANVLIET, KM ;
SUTHERLAND, AD .
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1980, 57 (02) :683-690
[8]  
KLASSEN FM, 1976, PHILLIPS RES REP, V31, P71
[9]   P-MOSFET PARAMETERS AT CRYOGENIC TEMPERATURES [J].
MADDOX, RL .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1976, 23 (01) :16-21
[10]   TEMPERATURE-DEPENDENCE OF MOSFET CHARACTERISTICS IN WEAK INVERSION [J].
NISHIDA, M ;
OHYABU, H .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1977, 24 (10) :1245-1248