NONLINEAR PROPAGATION OF VOID FRONT DURING ELECTROMIGRATION IN ALLOY-FILMS

被引：9

作者：

HO, PS

HOWARD, JK

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

[2] IBM CORP,SYST PROD DIV,E FISHKILL,NY 12533

来源：

APPLIED PHYSICS LETTERS | 1975年 / 27卷 / 05期

关键词：

D O I：

10.1063/1.88458

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：261 / 263

页数：3

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