SPUTTERING OF CU IN A HIGH-PRESSURE ATMOSPHERE

被引：17

作者：

ISHII, K

HANDA, S

TERAUCHI, H

机构：

来源：

APPLIED SURFACE SCIENCE | 1988年 / 33-4卷

关键词：

D O I：

10.1016/0169-4332(88)90423-0

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：1107 / 1113

页数：7

共 9 条

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[2] TECHNOLOGY AND APPLICATIONS OF BROAD-BEAM ION SOURCES USED IN SPUTTERING .2. APPLICATIONS [J].

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CUOMO, JJ ;

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[3] EFFECT OF ION-BOMBARDMENT DURING DEPOSITION ON THE X-RAY MICROSTRUCTURE OF THIN SILVER FILMS [J].

HUANG, TC ;

LIM, G ;

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KAY, E .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (06) :2161-2166

[4] SPUTTER-DEPOSITION OF FE FILMS IN A HIGH-PRESSURE ATMOSPHERE [J].

ISHII, K .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1987, 26 (06) :L932-L934

[5] APPLICATIONS OF MONTE-CARLO SIMULATION IN THE ANALYSIS OF A SPUTTER-DEPOSITION PROCESS [J].

MOTOHIRO, T .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (02) :189-195

[6]

SOMEKH RE, 1984, J VAC SCI TECHNOL A, V2, P1285, DOI 10.1116/1.572396

[7] ROLE OF IONS IN ION-BASED FILM FORMATION [J].

TAKAGI, T .

THIN SOLID FILMS, 1982, 92 (1-2) :1-17

[8] INFLUENCE OF BIAS SPUTTER PARAMETERS ON THICK COPPER COATINGS DEPOSITED USING A HOLLOW-CATHODE [J].

THORNTON, JA .

THIN SOLID FILMS, 1977, 40 (JAN) :335-344

[9]

WEISSMANTEL C, 1981, THIN SOLID FILMS, V80, P13

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