REACTIVE MAGNETRON SPUTTERED ZIRCONIUM-OXIDE AND ZIRCONIUM SILICON-OXIDE THIN-FILMS

被引：68

作者：

RUSSAK, MA ^{[1
]}

JAHNES, CV ^{[1
]}

KATZ, EP ^{[1
]}

机构：

[1] IBM CORP,DIV GEN TECHNOL,E FISHKILL,NY 12533

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 03期

关键词：

D O I：

10.1116/1.576263

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1248 / 1253

页数：6

共 16 条

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[2] EFFECTS OF OXYGEN-CONTENT ON THE OPTICAL-PROPERTIES OF TANTALUM OXIDE-FILMS DEPOSITED BY ION-BEAM SPUTTERING
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[5] STABILIZED ZIRCONIA ALUMINA THIN-FILMS
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[6] STABILIZATION OF TETRAGONAL ZRO2 WITH AL2O3 IN REACTIVE MAGNETRON SPUTTERED THIN-FILMS
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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1987, 5 (04): : 2085 - 2087
[7] HIGH-RATE REACTIVE SPUTTER DEPOSITION OF ZIRCONIUM DIOXIDE
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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (06): : 3088 - 3097
[8] OPTICAL-PROPERTIES OF THIN-FILMS OF TANTALUM PENTOXIDE AND ZIRCONIUM DIOXIDE
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[J]. THIN SOLID FILMS, 1975, 30 (02) : 361 - 369
[9] OPTICAL COATINGS FOR LASER FUSION APPLICATIONS
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RAINER, F
[J]. THIN SOLID FILMS, 1980, 73 (01) : 155 - 166
[10] NAGOMI M, 1985, J NONCRYST SOLIDS, V69, P415

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