INVESTIGATION OF COSPUTTERED W-C THIN-FILMS AS DIFFUSION-BARRIERS

被引：9

作者：

YANG, HY ^{[1
]}

ZHAO, XA ^{[1
]}

机构：

[1] CALTECH,PASADENA,CA 91125

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 03期

关键词：

D O I：

10.1116/1.575301

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1646 / 1649

页数：4

共 18 条

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[9] TIB2 AND ZRB2 DIFFUSION-BARRIERS IN GAAS OHMIC CONTACT TECHNOLOGY [J].

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[10] RESISTIVITY, OXIDATION-KINETICS AND DIFFUSION BARRIER PROPERTIES OF THIN-FILM ZRB2 [J].

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