REACTIVE PULSED LASER DEPOSITION OF TIN

被引：20

作者：

CRACIUN, D

CRACIUN, V

机构：

[1] Institute of Atomic Physics, Bucharest

来源：

APPLIED SURFACE SCIENCE | 1992年 / 54卷

关键词：

D O I：

10.1016/0169-4332(92)90021-O

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Pulsed laser radiation has been successfully employed for thin film titanium nitride deposition. A pure titanium target was reactively evaporated in a nitrogen atmosphere by a 4 J/cm2, 20 ns KrF laser pulse. The properties of the thin deposited films are studied.

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收藏

页码：75 / 77

页数：3

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