TRAP SUPPRESSION BY ISOELECTRONIC IN OR SB DOPING IN SI-DOPED N-GAAS GROWN BY MOLECULAR-BEAM EPITAXY

被引:20
作者
LI, AZ [1 ]
KIM, HK [1 ]
JEONG, JC [1 ]
WONG, D [1 ]
SCHLESINGER, TE [1 ]
MILNES, AG [1 ]
机构
[1] CARNEGIE MELLON UNIV,DEPT ELECT & COMP ENGN,PITTSBURGH,PA 15213
关键词
D O I
10.1063/1.341486
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:3497 / 3504
页数:8
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