LOW DIELECTRIC-CONSTANT AMORPHOUS SIBN TERNARY FILMS PREPARED BY PLASMA-ENHANCED DEPOSITION

被引：22

作者：

MAEDA, M ^{[1
]}

MAKINO, T ^{[1
]}

机构：

[1] NIPPON TELEGRAPH & TEL PUBL CORP, ATSUGI ELECT COMMUN LABS, ATSUGI, KANAGAWA 24301, JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 1987年 / 26卷 / 05期

关键词：

D O I：

10.1143/JJAP.26.660

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：660 / 665

页数：6

共 23 条

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