REOXIDIZED NITRIDED OXIDE FOR RADIATION-HARDENED MOS DEVICES

被引:35
作者
DUNN, GJ
WYATT, PW
机构
关键词
D O I
10.1109/23.45419
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:2161 / 2168
页数:8
相关论文
共 15 条
[1]   THE EFFECT OF GATE MATERIAL ON OXIDE DEGRADATION DUE TO CHARGE-INJECTION IN METAL-OXIDE-SEMICONDUCTOR CAPACITORS [J].
AVNI, E ;
SONNENBLICK, Y ;
NISSANCOHEN, Y .
SOLID-STATE ELECTRONICS, 1988, 31 (02) :245-250
[3]   HOLE TRAPPING IN REOXIDIZED NITRIDED SILICON DIOXIDE [J].
DUNN, GJ .
JOURNAL OF APPLIED PHYSICS, 1989, 65 (12) :4879-4883
[4]  
DUNN GJ, 1989, 1989 HEART C PATR AF
[5]   USING LABORATORY X-RAY AND CO-60 IRRADIATIONS TO PREDICT CMOS DEVICE RESPONSE IN STRATEGIC AND SPACE ENVIRONMENTS [J].
FLEETWOOD, DM ;
WINOKUR, PS ;
SCHWANK, JR .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1988, 35 (06) :1497-1505
[6]   IMPROVED TRANSCONDUCTANCE UNDER HIGH NORMAL FIELD IN MOSFETS WITH ULTRATHIN NITRIDED OXIDES [J].
HORI, T ;
IWASAKI, H .
IEEE ELECTRON DEVICE LETTERS, 1989, 10 (05) :195-197
[7]   MOBILITY DEGRADATION OF NITRIDED OXIDE MISFETS [J].
KUSAKA, T ;
HIRAIWA, A ;
MUKAI, K .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1988, 135 (01) :166-172
[8]   THE CONSTITUTION OF NITRIDED OXIDES AND REOXIDIZED NITRIDED OXIDES ON SILICON [J].
NAIMAN, ML ;
KIRK, CT ;
EMERSON, BL ;
TAITEL, JB ;
SENTURIA, SD .
JOURNAL OF APPLIED PHYSICS, 1985, 58 (02) :779-792
[9]   SPATIAL DEPENDENCE OF TRAPPED HOLES DETERMINED FROM TUNNELING ANALYSIS AND MEASURED ANNEALING [J].
OLDHAM, TR ;
LELIS, AJ ;
MCLEAN, FB .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1986, 33 (06) :1203-1209
[10]   INVERSION LAYER MOBILITY OF MOSFETS WITH NITRIDED OXIDE GATE DIELECTRICS [J].
SCHMIDT, MA ;
TERRY, FL ;
MATHUR, BP ;
SENTURIA, SD .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1988, 35 (10) :1627-1632