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REOXIDIZED NITRIDED OXIDE FOR RADIATION-HARDENED MOS DEVICES
被引:35
作者
:
DUNN, GJ
论文数:
0
引用数:
0
h-index:
0
DUNN, GJ
WYATT, PW
论文数:
0
引用数:
0
h-index:
0
WYATT, PW
机构
:
来源
:
IEEE TRANSACTIONS ON NUCLEAR SCIENCE
|
1989年
/ 36卷
/ 06期
关键词
:
D O I
:
10.1109/23.45419
中图分类号
:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号
:
0808 ;
0809 ;
摘要
:
引用
收藏
页码:2161 / 2168
页数:8
相关论文
共 15 条
[1]
THE EFFECT OF GATE MATERIAL ON OXIDE DEGRADATION DUE TO CHARGE-INJECTION IN METAL-OXIDE-SEMICONDUCTOR CAPACITORS
[J].
AVNI, E
论文数:
0
引用数:
0
h-index:
0
机构:
Hebrew Univ of Jerusalem, Jerusalem, Isr, Hebrew Univ of Jerusalem, Jerusalem, Isr
AVNI, E
;
SONNENBLICK, Y
论文数:
0
引用数:
0
h-index:
0
机构:
Hebrew Univ of Jerusalem, Jerusalem, Isr, Hebrew Univ of Jerusalem, Jerusalem, Isr
SONNENBLICK, Y
;
NISSANCOHEN, Y
论文数:
0
引用数:
0
h-index:
0
机构:
Hebrew Univ of Jerusalem, Jerusalem, Isr, Hebrew Univ of Jerusalem, Jerusalem, Isr
NISSANCOHEN, Y
.
SOLID-STATE ELECTRONICS,
1988,
31
(02)
:245
-250
[2]
GENERATION OF INTERFACE STATES IN NITRIDED OXIDE GATE DIELECTRICS BY IONIZING-RADIATION AND FOWLER-NORDHEIM STRESSING
[J].
DUNN, GJ
论文数:
0
引用数:
0
h-index:
0
DUNN, GJ
.
APPLIED PHYSICS LETTERS,
1988,
53
(17)
:1650
-1651
[3]
HOLE TRAPPING IN REOXIDIZED NITRIDED SILICON DIOXIDE
[J].
DUNN, GJ
论文数:
0
引用数:
0
h-index:
0
DUNN, GJ
.
JOURNAL OF APPLIED PHYSICS,
1989,
65
(12)
:4879
-4883
[4]
DUNN GJ, 1989, 1989 HEART C PATR AF
[5]
USING LABORATORY X-RAY AND CO-60 IRRADIATIONS TO PREDICT CMOS DEVICE RESPONSE IN STRATEGIC AND SPACE ENVIRONMENTS
[J].
FLEETWOOD, DM
论文数:
0
引用数:
0
h-index:
0
FLEETWOOD, DM
;
WINOKUR, PS
论文数:
0
引用数:
0
h-index:
0
WINOKUR, PS
;
SCHWANK, JR
论文数:
0
引用数:
0
h-index:
0
SCHWANK, JR
.
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1988,
35
(06)
:1497
-1505
[6]
IMPROVED TRANSCONDUCTANCE UNDER HIGH NORMAL FIELD IN MOSFETS WITH ULTRATHIN NITRIDED OXIDES
[J].
HORI, T
论文数:
0
引用数:
0
h-index:
0
HORI, T
;
IWASAKI, H
论文数:
0
引用数:
0
h-index:
0
IWASAKI, H
.
IEEE ELECTRON DEVICE LETTERS,
1989,
10
(05)
:195
-197
[7]
MOBILITY DEGRADATION OF NITRIDED OXIDE MISFETS
[J].
KUSAKA, T
论文数:
0
引用数:
0
h-index:
0
KUSAKA, T
;
HIRAIWA, A
论文数:
0
引用数:
0
h-index:
0
HIRAIWA, A
;
MUKAI, K
论文数:
0
引用数:
0
h-index:
0
MUKAI, K
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1988,
135
(01)
:166
-172
[8]
THE CONSTITUTION OF NITRIDED OXIDES AND REOXIDIZED NITRIDED OXIDES ON SILICON
[J].
NAIMAN, ML
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,CAMBRIDGE,MA 02139
MIT,CAMBRIDGE,MA 02139
NAIMAN, ML
;
KIRK, CT
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,CAMBRIDGE,MA 02139
MIT,CAMBRIDGE,MA 02139
KIRK, CT
;
EMERSON, BL
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,CAMBRIDGE,MA 02139
MIT,CAMBRIDGE,MA 02139
EMERSON, BL
;
TAITEL, JB
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,CAMBRIDGE,MA 02139
MIT,CAMBRIDGE,MA 02139
TAITEL, JB
;
SENTURIA, SD
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,CAMBRIDGE,MA 02139
MIT,CAMBRIDGE,MA 02139
SENTURIA, SD
.
JOURNAL OF APPLIED PHYSICS,
1985,
58
(02)
:779
-792
[9]
SPATIAL DEPENDENCE OF TRAPPED HOLES DETERMINED FROM TUNNELING ANALYSIS AND MEASURED ANNEALING
[J].
OLDHAM, TR
论文数:
0
引用数:
0
h-index:
0
OLDHAM, TR
;
LELIS, AJ
论文数:
0
引用数:
0
h-index:
0
LELIS, AJ
;
MCLEAN, FB
论文数:
0
引用数:
0
h-index:
0
MCLEAN, FB
.
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1986,
33
(06)
:1203
-1209
[10]
INVERSION LAYER MOBILITY OF MOSFETS WITH NITRIDED OXIDE GATE DIELECTRICS
[J].
SCHMIDT, MA
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,LINCOLN LAB,LEXINGTON,MA 02173
MIT,LINCOLN LAB,LEXINGTON,MA 02173
SCHMIDT, MA
;
TERRY, FL
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,LINCOLN LAB,LEXINGTON,MA 02173
MIT,LINCOLN LAB,LEXINGTON,MA 02173
TERRY, FL
;
MATHUR, BP
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,LINCOLN LAB,LEXINGTON,MA 02173
MIT,LINCOLN LAB,LEXINGTON,MA 02173
MATHUR, BP
;
SENTURIA, SD
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,LINCOLN LAB,LEXINGTON,MA 02173
MIT,LINCOLN LAB,LEXINGTON,MA 02173
SENTURIA, SD
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1988,
35
(10)
:1627
-1632
←
1
2
→
共 15 条
[1]
THE EFFECT OF GATE MATERIAL ON OXIDE DEGRADATION DUE TO CHARGE-INJECTION IN METAL-OXIDE-SEMICONDUCTOR CAPACITORS
[J].
AVNI, E
论文数:
0
引用数:
0
h-index:
0
机构:
Hebrew Univ of Jerusalem, Jerusalem, Isr, Hebrew Univ of Jerusalem, Jerusalem, Isr
AVNI, E
;
SONNENBLICK, Y
论文数:
0
引用数:
0
h-index:
0
机构:
Hebrew Univ of Jerusalem, Jerusalem, Isr, Hebrew Univ of Jerusalem, Jerusalem, Isr
SONNENBLICK, Y
;
NISSANCOHEN, Y
论文数:
0
引用数:
0
h-index:
0
机构:
Hebrew Univ of Jerusalem, Jerusalem, Isr, Hebrew Univ of Jerusalem, Jerusalem, Isr
NISSANCOHEN, Y
.
SOLID-STATE ELECTRONICS,
1988,
31
(02)
:245
-250
[2]
GENERATION OF INTERFACE STATES IN NITRIDED OXIDE GATE DIELECTRICS BY IONIZING-RADIATION AND FOWLER-NORDHEIM STRESSING
[J].
DUNN, GJ
论文数:
0
引用数:
0
h-index:
0
DUNN, GJ
.
APPLIED PHYSICS LETTERS,
1988,
53
(17)
:1650
-1651
[3]
HOLE TRAPPING IN REOXIDIZED NITRIDED SILICON DIOXIDE
[J].
DUNN, GJ
论文数:
0
引用数:
0
h-index:
0
DUNN, GJ
.
JOURNAL OF APPLIED PHYSICS,
1989,
65
(12)
:4879
-4883
[4]
DUNN GJ, 1989, 1989 HEART C PATR AF
[5]
USING LABORATORY X-RAY AND CO-60 IRRADIATIONS TO PREDICT CMOS DEVICE RESPONSE IN STRATEGIC AND SPACE ENVIRONMENTS
[J].
FLEETWOOD, DM
论文数:
0
引用数:
0
h-index:
0
FLEETWOOD, DM
;
WINOKUR, PS
论文数:
0
引用数:
0
h-index:
0
WINOKUR, PS
;
SCHWANK, JR
论文数:
0
引用数:
0
h-index:
0
SCHWANK, JR
.
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1988,
35
(06)
:1497
-1505
[6]
IMPROVED TRANSCONDUCTANCE UNDER HIGH NORMAL FIELD IN MOSFETS WITH ULTRATHIN NITRIDED OXIDES
[J].
HORI, T
论文数:
0
引用数:
0
h-index:
0
HORI, T
;
IWASAKI, H
论文数:
0
引用数:
0
h-index:
0
IWASAKI, H
.
IEEE ELECTRON DEVICE LETTERS,
1989,
10
(05)
:195
-197
[7]
MOBILITY DEGRADATION OF NITRIDED OXIDE MISFETS
[J].
KUSAKA, T
论文数:
0
引用数:
0
h-index:
0
KUSAKA, T
;
HIRAIWA, A
论文数:
0
引用数:
0
h-index:
0
HIRAIWA, A
;
MUKAI, K
论文数:
0
引用数:
0
h-index:
0
MUKAI, K
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1988,
135
(01)
:166
-172
[8]
THE CONSTITUTION OF NITRIDED OXIDES AND REOXIDIZED NITRIDED OXIDES ON SILICON
[J].
NAIMAN, ML
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,CAMBRIDGE,MA 02139
MIT,CAMBRIDGE,MA 02139
NAIMAN, ML
;
KIRK, CT
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,CAMBRIDGE,MA 02139
MIT,CAMBRIDGE,MA 02139
KIRK, CT
;
EMERSON, BL
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,CAMBRIDGE,MA 02139
MIT,CAMBRIDGE,MA 02139
EMERSON, BL
;
TAITEL, JB
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,CAMBRIDGE,MA 02139
MIT,CAMBRIDGE,MA 02139
TAITEL, JB
;
SENTURIA, SD
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,CAMBRIDGE,MA 02139
MIT,CAMBRIDGE,MA 02139
SENTURIA, SD
.
JOURNAL OF APPLIED PHYSICS,
1985,
58
(02)
:779
-792
[9]
SPATIAL DEPENDENCE OF TRAPPED HOLES DETERMINED FROM TUNNELING ANALYSIS AND MEASURED ANNEALING
[J].
OLDHAM, TR
论文数:
0
引用数:
0
h-index:
0
OLDHAM, TR
;
LELIS, AJ
论文数:
0
引用数:
0
h-index:
0
LELIS, AJ
;
MCLEAN, FB
论文数:
0
引用数:
0
h-index:
0
MCLEAN, FB
.
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1986,
33
(06)
:1203
-1209
[10]
INVERSION LAYER MOBILITY OF MOSFETS WITH NITRIDED OXIDE GATE DIELECTRICS
[J].
SCHMIDT, MA
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,LINCOLN LAB,LEXINGTON,MA 02173
MIT,LINCOLN LAB,LEXINGTON,MA 02173
SCHMIDT, MA
;
TERRY, FL
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,LINCOLN LAB,LEXINGTON,MA 02173
MIT,LINCOLN LAB,LEXINGTON,MA 02173
TERRY, FL
;
MATHUR, BP
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,LINCOLN LAB,LEXINGTON,MA 02173
MIT,LINCOLN LAB,LEXINGTON,MA 02173
MATHUR, BP
;
SENTURIA, SD
论文数:
0
引用数:
0
h-index:
0
机构:
MIT,LINCOLN LAB,LEXINGTON,MA 02173
MIT,LINCOLN LAB,LEXINGTON,MA 02173
SENTURIA, SD
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1988,
35
(10)
:1627
-1632
←
1
2
→