PLASMA DEPOSITION OF SILICON-NITRIDE FILMS IN A RADIAL-FLOW REACTOR

被引：6

作者：

YOO, CS ^{[1
]}

DIXON, AG ^{[1
]}

机构：

[1] WORCESTER POLYTECH INST, DEPT CHEM ENGN, WORCESTER, MA 01609 USA

来源：

AICHE JOURNAL | 1989年 / 35卷 / 06期

关键词：

D O I：

10.1002/aic.690350613

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

引用

页码：995 / 1002

页数：8

共 39 条

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