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ANNEALING OF MOS CAPACITORS WITH IMPLICATIONS FOR TEST PROCEDURES TO DETERMINE RADIATION HARDNESS
被引:32
作者
:
WINOKUR, PS
论文数:
0
引用数:
0
h-index:
0
WINOKUR, PS
BOESCH, HE
论文数:
0
引用数:
0
h-index:
0
BOESCH, HE
机构
:
来源
:
IEEE TRANSACTIONS ON NUCLEAR SCIENCE
|
1981年
/ 28卷
/ 06期
关键词
:
D O I
:
10.1109/TNS.1981.4335680
中图分类号
:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号
:
0808 ;
0809 ;
摘要
:
引用
收藏
页码:4088 / 4094
页数:7
相关论文
共 18 条
[1]
HOLE TRANSPORT AND CHARGE RELAXATION IN IRRADIATED SIO2 MOS CAPACITORS
[J].
BOESCH, HE
论文数:
0
引用数:
0
h-index:
0
机构:
HARRY DIAMOND LABS, ADELPHIA, MD 20782 USA
HARRY DIAMOND LABS, ADELPHIA, MD 20782 USA
BOESCH, HE
;
MCLEAN, FB
论文数:
0
引用数:
0
h-index:
0
机构:
HARRY DIAMOND LABS, ADELPHIA, MD 20782 USA
HARRY DIAMOND LABS, ADELPHIA, MD 20782 USA
MCLEAN, FB
;
MCGARRITY, JM
论文数:
0
引用数:
0
h-index:
0
机构:
HARRY DIAMOND LABS, ADELPHIA, MD 20782 USA
HARRY DIAMOND LABS, ADELPHIA, MD 20782 USA
MCGARRITY, JM
;
AUSMAN, GA
论文数:
0
引用数:
0
h-index:
0
机构:
HARRY DIAMOND LABS, ADELPHIA, MD 20782 USA
HARRY DIAMOND LABS, ADELPHIA, MD 20782 USA
AUSMAN, GA
.
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1975,
22
(06)
:2163
-2167
[2]
ENHANCED FLATBAND VOLTAGE RECOVERY IN HARDENED THIN MOS CAPACITORS
[J].
BOESCH, HE
论文数:
0
引用数:
0
h-index:
0
BOESCH, HE
;
MCLEAN, FB
论文数:
0
引用数:
0
h-index:
0
MCLEAN, FB
;
MCGARRITY, JM
论文数:
0
引用数:
0
h-index:
0
MCGARRITY, JM
;
WINOKUR, PS
论文数:
0
引用数:
0
h-index:
0
WINOKUR, PS
.
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1978,
25
(06)
:1239
-1245
[3]
FREQUENCY AND TEMPERATURE TESTS FOR LATERAL NONUNIFORMITIES IN MIS CAPACITORS
[J].
CHANG, CC
论文数:
0
引用数:
0
h-index:
0
机构:
IND TECH RES INST, HSINCHU, TAIWAN
CHANG, CC
;
JOHNSON, WC
论文数:
0
引用数:
0
h-index:
0
机构:
IND TECH RES INST, HSINCHU, TAIWAN
JOHNSON, WC
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1977,
24
(10)
:1249
-1255
[4]
ACTIVATION-ENERGIES OF THERMAL ANNEALING OF RADIATION-INDUCED DAMAGE IN NORMAL-CHANNELS AND PARA-CHANNELS OF CMOS INTEGRATED-CIRCUITS
[J].
DANCHENKO, V
论文数:
0
引用数:
0
h-index:
0
机构:
BOSTON COLL,DEPT PHYS,CHESTNUT HILL,MA 02167
DANCHENKO, V
;
STASSINOPOULOS, EG
论文数:
0
引用数:
0
h-index:
0
机构:
BOSTON COLL,DEPT PHYS,CHESTNUT HILL,MA 02167
STASSINOPOULOS, EG
;
FANG, PH
论文数:
0
引用数:
0
h-index:
0
机构:
BOSTON COLL,DEPT PHYS,CHESTNUT HILL,MA 02167
FANG, PH
;
BRASHEARS, SS
论文数:
0
引用数:
0
h-index:
0
机构:
BOSTON COLL,DEPT PHYS,CHESTNUT HILL,MA 02167
BRASHEARS, SS
.
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1980,
27
(06)
:1658
-1664
[5]
CMOS HARDNESS PREDICTION FOR LOW-DOSE-RATE ENVIRONMENTS
[J].
DERBENWICK, GF
论文数:
0
引用数:
0
h-index:
0
DERBENWICK, GF
;
SANDER, HH
论文数:
0
引用数:
0
h-index:
0
SANDER, HH
.
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1977,
24
(06)
:2244
-2247
[6]
DENSITY OF SIO2-SI INTERFACE STATES - (MOS DEVICES SI OXIDATION 100 DEGREES C O2 + 80 PPM H2O FERMI LEVEL E)
[J].
GRAY, PV
论文数:
0
引用数:
0
h-index:
0
GRAY, PV
;
BROWN, DM
论文数:
0
引用数:
0
h-index:
0
BROWN, DM
.
APPLIED PHYSICS LETTERS,
1966,
8
(02)
:31
-&
[7]
ROOM-TEMPERATURE ANNEALING OF IONIZATION-INDUCED DAMAGE IN CMOS CIRCUITS
[J].
HABING, DH
论文数:
0
引用数:
0
h-index:
0
机构:
SANDIA LABS,ALBUQUERQUE,NM 87115
SANDIA LABS,ALBUQUERQUE,NM 87115
HABING, DH
;
SHAFER, BD
论文数:
0
引用数:
0
h-index:
0
机构:
SANDIA LABS,ALBUQUERQUE,NM 87115
SANDIA LABS,ALBUQUERQUE,NM 87115
SHAFER, BD
.
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1973,
NS20
(06)
:307
-314
[8]
HU G, 1979, THESIS PRINCETON U
[9]
RAPID ANNEALING AND CHARGE INJECTION IN AL2O3 MIS CAPACITORS
[J].
MCLEAN, FB
论文数:
0
引用数:
0
h-index:
0
机构:
HARRY DIAMOND LABS,WASHINGTON,DC 20438
HARRY DIAMOND LABS,WASHINGTON,DC 20438
MCLEAN, FB
;
BOESCH, HE
论文数:
0
引用数:
0
h-index:
0
机构:
HARRY DIAMOND LABS,WASHINGTON,DC 20438
HARRY DIAMOND LABS,WASHINGTON,DC 20438
BOESCH, HE
;
WINOKUR, PS
论文数:
0
引用数:
0
h-index:
0
机构:
HARRY DIAMOND LABS,WASHINGTON,DC 20438
HARRY DIAMOND LABS,WASHINGTON,DC 20438
WINOKUR, PS
;
MCGARRITY, JM
论文数:
0
引用数:
0
h-index:
0
机构:
HARRY DIAMOND LABS,WASHINGTON,DC 20438
HARRY DIAMOND LABS,WASHINGTON,DC 20438
MCGARRITY, JM
;
OSWALD, RB
论文数:
0
引用数:
0
h-index:
0
机构:
HARRY DIAMOND LABS,WASHINGTON,DC 20438
HARRY DIAMOND LABS,WASHINGTON,DC 20438
OSWALD, RB
.
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1974,
NS21
(06)
:47
-55
[10]
HOLE TRANSPORT AND RECOVERY CHARACTERISTICS OF SIO2 GATE INSULATORS
[J].
MCLEAN, FB
论文数:
0
引用数:
0
h-index:
0
机构:
HARRY DIAMOND LABS, ADELPHI, MD 20783 USA
HARRY DIAMOND LABS, ADELPHI, MD 20783 USA
MCLEAN, FB
;
BOESCH, HE
论文数:
0
引用数:
0
h-index:
0
机构:
HARRY DIAMOND LABS, ADELPHI, MD 20783 USA
HARRY DIAMOND LABS, ADELPHI, MD 20783 USA
BOESCH, HE
;
MCGARRITY, JM
论文数:
0
引用数:
0
h-index:
0
机构:
HARRY DIAMOND LABS, ADELPHI, MD 20783 USA
HARRY DIAMOND LABS, ADELPHI, MD 20783 USA
MCGARRITY, JM
.
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1976,
23
(06)
:1506
-1512
←
1
2
→
共 18 条
[1]
HOLE TRANSPORT AND CHARGE RELAXATION IN IRRADIATED SIO2 MOS CAPACITORS
[J].
BOESCH, HE
论文数:
0
引用数:
0
h-index:
0
机构:
HARRY DIAMOND LABS, ADELPHIA, MD 20782 USA
HARRY DIAMOND LABS, ADELPHIA, MD 20782 USA
BOESCH, HE
;
MCLEAN, FB
论文数:
0
引用数:
0
h-index:
0
机构:
HARRY DIAMOND LABS, ADELPHIA, MD 20782 USA
HARRY DIAMOND LABS, ADELPHIA, MD 20782 USA
MCLEAN, FB
;
MCGARRITY, JM
论文数:
0
引用数:
0
h-index:
0
机构:
HARRY DIAMOND LABS, ADELPHIA, MD 20782 USA
HARRY DIAMOND LABS, ADELPHIA, MD 20782 USA
MCGARRITY, JM
;
AUSMAN, GA
论文数:
0
引用数:
0
h-index:
0
机构:
HARRY DIAMOND LABS, ADELPHIA, MD 20782 USA
HARRY DIAMOND LABS, ADELPHIA, MD 20782 USA
AUSMAN, GA
.
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1975,
22
(06)
:2163
-2167
[2]
ENHANCED FLATBAND VOLTAGE RECOVERY IN HARDENED THIN MOS CAPACITORS
[J].
BOESCH, HE
论文数:
0
引用数:
0
h-index:
0
BOESCH, HE
;
MCLEAN, FB
论文数:
0
引用数:
0
h-index:
0
MCLEAN, FB
;
MCGARRITY, JM
论文数:
0
引用数:
0
h-index:
0
MCGARRITY, JM
;
WINOKUR, PS
论文数:
0
引用数:
0
h-index:
0
WINOKUR, PS
.
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1978,
25
(06)
:1239
-1245
[3]
FREQUENCY AND TEMPERATURE TESTS FOR LATERAL NONUNIFORMITIES IN MIS CAPACITORS
[J].
CHANG, CC
论文数:
0
引用数:
0
h-index:
0
机构:
IND TECH RES INST, HSINCHU, TAIWAN
CHANG, CC
;
JOHNSON, WC
论文数:
0
引用数:
0
h-index:
0
机构:
IND TECH RES INST, HSINCHU, TAIWAN
JOHNSON, WC
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1977,
24
(10)
:1249
-1255
[4]
ACTIVATION-ENERGIES OF THERMAL ANNEALING OF RADIATION-INDUCED DAMAGE IN NORMAL-CHANNELS AND PARA-CHANNELS OF CMOS INTEGRATED-CIRCUITS
[J].
DANCHENKO, V
论文数:
0
引用数:
0
h-index:
0
机构:
BOSTON COLL,DEPT PHYS,CHESTNUT HILL,MA 02167
DANCHENKO, V
;
STASSINOPOULOS, EG
论文数:
0
引用数:
0
h-index:
0
机构:
BOSTON COLL,DEPT PHYS,CHESTNUT HILL,MA 02167
STASSINOPOULOS, EG
;
FANG, PH
论文数:
0
引用数:
0
h-index:
0
机构:
BOSTON COLL,DEPT PHYS,CHESTNUT HILL,MA 02167
FANG, PH
;
BRASHEARS, SS
论文数:
0
引用数:
0
h-index:
0
机构:
BOSTON COLL,DEPT PHYS,CHESTNUT HILL,MA 02167
BRASHEARS, SS
.
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1980,
27
(06)
:1658
-1664
[5]
CMOS HARDNESS PREDICTION FOR LOW-DOSE-RATE ENVIRONMENTS
[J].
DERBENWICK, GF
论文数:
0
引用数:
0
h-index:
0
DERBENWICK, GF
;
SANDER, HH
论文数:
0
引用数:
0
h-index:
0
SANDER, HH
.
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1977,
24
(06)
:2244
-2247
[6]
DENSITY OF SIO2-SI INTERFACE STATES - (MOS DEVICES SI OXIDATION 100 DEGREES C O2 + 80 PPM H2O FERMI LEVEL E)
[J].
GRAY, PV
论文数:
0
引用数:
0
h-index:
0
GRAY, PV
;
BROWN, DM
论文数:
0
引用数:
0
h-index:
0
BROWN, DM
.
APPLIED PHYSICS LETTERS,
1966,
8
(02)
:31
-&
[7]
ROOM-TEMPERATURE ANNEALING OF IONIZATION-INDUCED DAMAGE IN CMOS CIRCUITS
[J].
HABING, DH
论文数:
0
引用数:
0
h-index:
0
机构:
SANDIA LABS,ALBUQUERQUE,NM 87115
SANDIA LABS,ALBUQUERQUE,NM 87115
HABING, DH
;
SHAFER, BD
论文数:
0
引用数:
0
h-index:
0
机构:
SANDIA LABS,ALBUQUERQUE,NM 87115
SANDIA LABS,ALBUQUERQUE,NM 87115
SHAFER, BD
.
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1973,
NS20
(06)
:307
-314
[8]
HU G, 1979, THESIS PRINCETON U
[9]
RAPID ANNEALING AND CHARGE INJECTION IN AL2O3 MIS CAPACITORS
[J].
MCLEAN, FB
论文数:
0
引用数:
0
h-index:
0
机构:
HARRY DIAMOND LABS,WASHINGTON,DC 20438
HARRY DIAMOND LABS,WASHINGTON,DC 20438
MCLEAN, FB
;
BOESCH, HE
论文数:
0
引用数:
0
h-index:
0
机构:
HARRY DIAMOND LABS,WASHINGTON,DC 20438
HARRY DIAMOND LABS,WASHINGTON,DC 20438
BOESCH, HE
;
WINOKUR, PS
论文数:
0
引用数:
0
h-index:
0
机构:
HARRY DIAMOND LABS,WASHINGTON,DC 20438
HARRY DIAMOND LABS,WASHINGTON,DC 20438
WINOKUR, PS
;
MCGARRITY, JM
论文数:
0
引用数:
0
h-index:
0
机构:
HARRY DIAMOND LABS,WASHINGTON,DC 20438
HARRY DIAMOND LABS,WASHINGTON,DC 20438
MCGARRITY, JM
;
OSWALD, RB
论文数:
0
引用数:
0
h-index:
0
机构:
HARRY DIAMOND LABS,WASHINGTON,DC 20438
HARRY DIAMOND LABS,WASHINGTON,DC 20438
OSWALD, RB
.
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1974,
NS21
(06)
:47
-55
[10]
HOLE TRANSPORT AND RECOVERY CHARACTERISTICS OF SIO2 GATE INSULATORS
[J].
MCLEAN, FB
论文数:
0
引用数:
0
h-index:
0
机构:
HARRY DIAMOND LABS, ADELPHI, MD 20783 USA
HARRY DIAMOND LABS, ADELPHI, MD 20783 USA
MCLEAN, FB
;
BOESCH, HE
论文数:
0
引用数:
0
h-index:
0
机构:
HARRY DIAMOND LABS, ADELPHI, MD 20783 USA
HARRY DIAMOND LABS, ADELPHI, MD 20783 USA
BOESCH, HE
;
MCGARRITY, JM
论文数:
0
引用数:
0
h-index:
0
机构:
HARRY DIAMOND LABS, ADELPHI, MD 20783 USA
HARRY DIAMOND LABS, ADELPHI, MD 20783 USA
MCGARRITY, JM
.
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1976,
23
(06)
:1506
-1512
←
1
2
→