A MODEL OF 1/F NOISE IN POLYSILICON RESISTORS

被引:24
作者
JANG, SL
机构
[1] Department of Electronic Engineering, National Taiwan Institute of Technology, Taipei, 10772, 43 Keelung Road
关键词
D O I
10.1016/0038-1101(90)90094-U
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A new noise model is presented to describe 1 f noise in polysilicon resistors. This model is based on the mobility fluctuations in the depletion regions of grain-boundaries. The new physical mechanisms included are the potential, carrier number and depletion width fluctuations resulting from the mobility fluctuations in the depletion regions. From the experimental data on phosphorus-doped polysilicon resistors in the literature and from the theory, a value of 1.26 × 10-6 for the Hooge parameter and a value of 3.53 × 1012 cm-2 for the surface density of electron traps at the grain boundaries are derived. © 1990.
引用
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页码:1155 / 1162
页数:8
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