VISIBLE VS NEAR-INFRARED ELLIPSOMETRY FOR THE INVESTIGATION OF AMORPHOUS-SILICON FILMS PRODUCED BY ION-IMPLANTATION

被引：2

作者：

SIMARDNORMANDIN, M ^{[1
]}

FEW, IS ^{[1
]}

KALNITSKY, A ^{[1
]}

NORMANDIN, R ^{[1
]}

MARTE, C ^{[1
]}

BEAULIEU, Y ^{[1
]}

机构：

[1] NATL RES COUNCIL CANADA,DIV PHYS,OTTAWA K1A 0R6,ONTARIO,CANADA

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1987年 / 134卷 / 07期

关键词：

D O I：

10.1149/1.2100759

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1794 / 1798

页数：5

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