ELECTRON-BEAM EVAPORATED PHOSPHOSILICATE GLASS ENCAPSULANT FOR POST-IMPLANT ANNEALING OF GAAS

被引：7

作者：

SINGH, S

BAIOCCHI, F

BUTHERUS, AD

GRODKIEWICZ, WH

SCHWARTZ, B

VANUITERT, LG

YESIS, L

ZYDZIK, GJ

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1988年 / 64卷 / 08期

关键词：

D O I：

10.1063/1.341334

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：4194 / 4198

页数：5

共 14 条

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