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HYSTERESIS AND MEMORY PROPERTIES OF SILICON-SILICON NITRIDE SYSTEM
被引:12
作者
:
KENDALL, EJM
论文数:
0
引用数:
0
h-index:
0
KENDALL, EJM
机构
:
来源
:
SOLID-STATE ELECTRONICS
|
1971年
/ 14卷
/ 09期
关键词
:
D O I
:
10.1016/S0038-1101(71)80004-7
中图分类号
:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号
:
0808 ;
0809 ;
摘要
:
引用
收藏
页码:791 / &
相关论文
共 27 条
[1]
SOME PROPERTIES OF VAPOR DEPOSITED SILICON NITRIDE FILMS USING SIH4-NH3-H2 SYSTEM
BEAN, KE
论文数:
0
引用数:
0
h-index:
0
BEAN, KE
GLEIM, PS
论文数:
0
引用数:
0
h-index:
0
GLEIM, PS
YEAKLEY, RL
论文数:
0
引用数:
0
h-index:
0
YEAKLEY, RL
RUNYAN, WR
论文数:
0
引用数:
0
h-index:
0
RUNYAN, WR
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1967,
114
(07)
: 733
-
&
[2]
PROPERTIES OF SIXOYNZ FILMS ON SI
BROWN, DM
论文数:
0
引用数:
0
h-index:
0
机构:
General Electric Research and Development Center, Schenectady, New York
BROWN, DM
GRAY, PV
论文数:
0
引用数:
0
h-index:
0
机构:
General Electric Research and Development Center, Schenectady, New York
GRAY, PV
HEUMANN, FK
论文数:
0
引用数:
0
h-index:
0
机构:
General Electric Research and Development Center, Schenectady, New York
HEUMANN, FK
PHILIPP, HR
论文数:
0
引用数:
0
h-index:
0
机构:
General Electric Research and Development Center, Schenectady, New York
PHILIPP, HR
TAFT, EA
论文数:
0
引用数:
0
h-index:
0
机构:
General Electric Research and Development Center, Schenectady, New York
TAFT, EA
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1968,
115
(03)
: 311
-
&
[3]
PREPARATION AND C-V CHARACTERISTICS OF SI-SI3N4 AND SI-SIO2-SI3N4 STRUCTURES
CHU, TL
论文数:
0
引用数:
0
h-index:
0
CHU, TL
SZEDON, JR
论文数:
0
引用数:
0
h-index:
0
SZEDON, JR
LEE, CH
论文数:
0
引用数:
0
h-index:
0
LEE, CH
[J].
SOLID-STATE ELECTRONICS,
1967,
10
(09)
: 897
-
&
[4]
STRUCTURE AND SODIUM MIGRATION IN SILICON NITRIDE FILMS
DALTON, JV
论文数:
0
引用数:
0
h-index:
0
DALTON, JV
DROBEK, J
论文数:
0
引用数:
0
h-index:
0
DROBEK, J
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1968,
115
(08)
: 865
-
+
[5]
DANBY PCG, 1970, ELECTRON ENGNG
[6]
ELECTRICAL PROPERTIES OF VAPOR-DEPOSITED SILICON NITRIDE AND SILICON OXIDE FILMS ON SILICON
DEAL, BE
论文数:
0
引用数:
0
h-index:
0
DEAL, BE
FLEMING, PJ
论文数:
0
引用数:
0
h-index:
0
FLEMING, PJ
CASTRO, PL
论文数:
0
引用数:
0
h-index:
0
CASTRO, PL
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1968,
115
(03)
: 300
-
&
[7]
CHARGE TRANSPORT AND STORAGE IN METAL-NITRIDE-OXIDE-SILICON (MNOS) STRUCTURES
FROHMANB.D
论文数:
0
引用数:
0
h-index:
0
机构:
Fairchild Semiconductor, Research and Development Laboratory, Palo Alto, CA 94304
FROHMANB.D
LENZLINGER, M
论文数:
0
引用数:
0
h-index:
0
机构:
Fairchild Semiconductor, Research and Development Laboratory, Palo Alto, CA 94304
LENZLINGER, M
[J].
JOURNAL OF APPLIED PHYSICS,
1969,
40
(08)
: 3307
-
+
[8]
GOODMAN AM, 1970, RCA REV, V31, P342
[9]
CRYSTAL STRUCTURES OF SILICON NITRIDE
HARDIE, D
论文数:
0
引用数:
0
h-index:
0
HARDIE, D
JACK, KH
论文数:
0
引用数:
0
h-index:
0
JACK, KH
[J].
NATURE,
1957,
180
(4581)
: 332
-
333
[10]
EVIDENCE OF HOLE INJECTION AND TRAPPING IN SILICON NITRIDE FILMS PREPARED BY REACTIVE SPUTTERING
HU, SM
论文数:
0
引用数:
0
h-index:
0
HU, SM
KERR, DR
论文数:
0
引用数:
0
h-index:
0
KERR, DR
GREGOR, LV
论文数:
0
引用数:
0
h-index:
0
GREGOR, LV
[J].
APPLIED PHYSICS LETTERS,
1967,
10
(03)
: 97
-
&
←
1
2
3
→
共 27 条
[1]
SOME PROPERTIES OF VAPOR DEPOSITED SILICON NITRIDE FILMS USING SIH4-NH3-H2 SYSTEM
BEAN, KE
论文数:
0
引用数:
0
h-index:
0
BEAN, KE
GLEIM, PS
论文数:
0
引用数:
0
h-index:
0
GLEIM, PS
YEAKLEY, RL
论文数:
0
引用数:
0
h-index:
0
YEAKLEY, RL
RUNYAN, WR
论文数:
0
引用数:
0
h-index:
0
RUNYAN, WR
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1967,
114
(07)
: 733
-
&
[2]
PROPERTIES OF SIXOYNZ FILMS ON SI
BROWN, DM
论文数:
0
引用数:
0
h-index:
0
机构:
General Electric Research and Development Center, Schenectady, New York
BROWN, DM
GRAY, PV
论文数:
0
引用数:
0
h-index:
0
机构:
General Electric Research and Development Center, Schenectady, New York
GRAY, PV
HEUMANN, FK
论文数:
0
引用数:
0
h-index:
0
机构:
General Electric Research and Development Center, Schenectady, New York
HEUMANN, FK
PHILIPP, HR
论文数:
0
引用数:
0
h-index:
0
机构:
General Electric Research and Development Center, Schenectady, New York
PHILIPP, HR
TAFT, EA
论文数:
0
引用数:
0
h-index:
0
机构:
General Electric Research and Development Center, Schenectady, New York
TAFT, EA
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1968,
115
(03)
: 311
-
&
[3]
PREPARATION AND C-V CHARACTERISTICS OF SI-SI3N4 AND SI-SIO2-SI3N4 STRUCTURES
CHU, TL
论文数:
0
引用数:
0
h-index:
0
CHU, TL
SZEDON, JR
论文数:
0
引用数:
0
h-index:
0
SZEDON, JR
LEE, CH
论文数:
0
引用数:
0
h-index:
0
LEE, CH
[J].
SOLID-STATE ELECTRONICS,
1967,
10
(09)
: 897
-
&
[4]
STRUCTURE AND SODIUM MIGRATION IN SILICON NITRIDE FILMS
DALTON, JV
论文数:
0
引用数:
0
h-index:
0
DALTON, JV
DROBEK, J
论文数:
0
引用数:
0
h-index:
0
DROBEK, J
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1968,
115
(08)
: 865
-
+
[5]
DANBY PCG, 1970, ELECTRON ENGNG
[6]
ELECTRICAL PROPERTIES OF VAPOR-DEPOSITED SILICON NITRIDE AND SILICON OXIDE FILMS ON SILICON
DEAL, BE
论文数:
0
引用数:
0
h-index:
0
DEAL, BE
FLEMING, PJ
论文数:
0
引用数:
0
h-index:
0
FLEMING, PJ
CASTRO, PL
论文数:
0
引用数:
0
h-index:
0
CASTRO, PL
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1968,
115
(03)
: 300
-
&
[7]
CHARGE TRANSPORT AND STORAGE IN METAL-NITRIDE-OXIDE-SILICON (MNOS) STRUCTURES
FROHMANB.D
论文数:
0
引用数:
0
h-index:
0
机构:
Fairchild Semiconductor, Research and Development Laboratory, Palo Alto, CA 94304
FROHMANB.D
LENZLINGER, M
论文数:
0
引用数:
0
h-index:
0
机构:
Fairchild Semiconductor, Research and Development Laboratory, Palo Alto, CA 94304
LENZLINGER, M
[J].
JOURNAL OF APPLIED PHYSICS,
1969,
40
(08)
: 3307
-
+
[8]
GOODMAN AM, 1970, RCA REV, V31, P342
[9]
CRYSTAL STRUCTURES OF SILICON NITRIDE
HARDIE, D
论文数:
0
引用数:
0
h-index:
0
HARDIE, D
JACK, KH
论文数:
0
引用数:
0
h-index:
0
JACK, KH
[J].
NATURE,
1957,
180
(4581)
: 332
-
333
[10]
EVIDENCE OF HOLE INJECTION AND TRAPPING IN SILICON NITRIDE FILMS PREPARED BY REACTIVE SPUTTERING
HU, SM
论文数:
0
引用数:
0
h-index:
0
HU, SM
KERR, DR
论文数:
0
引用数:
0
h-index:
0
KERR, DR
GREGOR, LV
论文数:
0
引用数:
0
h-index:
0
GREGOR, LV
[J].
APPLIED PHYSICS LETTERS,
1967,
10
(03)
: 97
-
&
←
1
2
3
→