X-ray absorption micro spectroscopy using Kelvin force microscopy with an X-ray source

被引:5
作者
Ishii, M [1 ]
Rigopoulos, N
Poolton, N
Hamilton, B
机构
[1] SPring 8, RIKEN, JASRI, Sayo, Hyogo 6795198, Japan
[2] Univ Manchester, Manchester M60 1QD, Lancs, England
[3] SERC, Daresbury Lab, Warrington WA4 4AD, Cheshire, England
关键词
microspectroscopy; KFM; x-ray absorption; chemical-state mapping;
D O I
10.1016/j.physb.2005.12.236
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
To investigate the electronic states of surface electron-trapping centers, Kelvin force microscopy with an X-ray source (X-KFM) was developed. An X-KFM signal with respect to the X-ray photon energy represents the X-ray absorption spectrum in a specific sample-bias condition, minimizing secondary electrons from bulk. The X-KFM signal is generated by photoionization of the surface trapping center under the probe, and this bias condition emphasizes the local information. The absorption spectrum of a trapping center on a Si wafer with native oxide was explained from a structural model proposed in a previous study: the trapping center is Si with insufficient 0 termination at the atomic step edge. The X-KFM image emphasized the electronic states intrinsic to the trapping center, enabling the chemical states on the sample surface to be mapped. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:950 / 954
页数:5
相关论文
共 10 条
[1]   A new XUV beamline on a multi-pole wiggler in the SRS [J].
Bowler, M ;
West, JB ;
Quinn, FM ;
Holland, DMP ;
Fell, B ;
Hatherly, PA ;
Humphrey, I ;
Flavell, WR ;
Hamilton, B .
SURFACE REVIEW AND LETTERS, 2002, 9 (01) :577-581
[2]   NANOMETER-SCALE IMAGING OF POTENTIAL PROFILES IN OPTICALLY-EXCITED N-I-P-I HETEROSTRUCTURE USING KELVIN PROBE FORCE MICROSCOPY [J].
CHAVEZPIRSON, A ;
VATEL, O ;
TANIMOTO, M ;
ANDO, H ;
IWAMURA, H ;
KANBE, H .
APPLIED PHYSICS LETTERS, 1995, 67 (21) :3069-3071
[3]   Time transient investigation of photo-induced electron localization at atomic step edges of Si(111) [J].
Ishii, M ;
Hamilton, B .
APPLIED SURFACE SCIENCE, 2005, 248 (1-4) :14-18
[4]   Electron trapping at the Si (111) atomic step edge [J].
Ishii, M ;
Hamilton, B .
APPLIED PHYSICS LETTERS, 2004, 85 (09) :1610-1612
[5]   EXTENDED X-RAY-ABSORPTION FINE-STRUCTURE TECHNIQUE .2. EXPERIMENTAL PRACTICE AND SELECTED RESULTS [J].
LYTLE, FW ;
SAYERS, DE ;
STERN, EA .
PHYSICAL REVIEW B, 1975, 11 (12) :4825-4835
[6]   Surface potential profiling and contact resistance measurements on operating pentacene thin-film transistors by Kelvin probe force microscopy [J].
Puntambekar, KP ;
Pesavento, PV ;
Frisbie, CD .
APPLIED PHYSICS LETTERS, 2003, 83 (26) :5539-5541
[7]   True atomic resolution imaging of surface structure and surface charge on the GaAs(110) [J].
Sugawara, Y ;
Uchihashi, T ;
Abe, M ;
Morita, S .
APPLIED SURFACE SCIENCE, 1999, 140 (3-4) :371-375
[8]   ABINITIO CALCULATIONS OF AMPLITUDE AND PHASE FUNCTIONS FOR EXTENDED X-RAY ABSORPTION FINE-STRUCTURE SPECTROSCOPY [J].
TEO, BK ;
LEE, PA .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1979, 101 (11) :2815-2832
[9]   Development of ultrahigh vacuum atomic force microscopy with frequency modulation detection and its application to electrostatic force measurement [J].
Uchihashi, T ;
Ohta, M ;
Sugawara, Y ;
Yanase, Y ;
Sigematsu, T ;
Suzuki, M ;
Morita, S .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1997, 15 (04) :1543-1546
[10]   Electronic structure analysis of α-SiO2 via x-ray absorption near-edge structure at the Si K, L2,3 and O K edges [J].
Wu, ZY ;
Jollet, F ;
Seifert, F .
JOURNAL OF PHYSICS-CONDENSED MATTER, 1998, 10 (36) :8083-8092